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Focused-ion-beam nanostructuring of Al<sub>2</sub>O<sub>3</sub>dielectric layers for photonic applications

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dc.contributor.authorFeridun Ay
dc.contributor.authorAy, Feridun
dc.contributor.authorKerstin Wörhoff
dc.contributor.authorR.M. de Ridder
dc.contributor.authorMarkus Pollnau
dc.contributor.orcid0000-0003-2255-1156
dc.contributor.orcid0000-0003-4535-4358
dc.date.accessioned2025-11-13T10:11:56Z
dc.date.issued2012-08-23
dc.identifier.doi10.1088/0960-1317/22/10/105008
dc.identifier.endpage105008
dc.identifier.issn0960-1317
dc.identifier.issue10
dc.identifier.openalexW2106354788
dc.identifier.scopus2-s2.0-84866309578
dc.identifier.startpage105008
dc.identifier.urihttps://hdl.handle.net/11421/3420
dc.identifier.urihttps://doi.org/10.1088/0960-1317/22/10/105008
dc.identifier.volume22
dc.identifier.wos000309219500008
dc.language.isoen
dc.relation.ispartofJournal of Micromechanics and Microengineering
dc.rightsrestrictedAccess
dc.subjectMaterials science
dc.subjectDwell time
dc.subjectFocused ion beam
dc.subjectFabrication
dc.subjectIon beam
dc.subjectDielectric
dc.subjectOptoelectronics
dc.subjectPhotonics
dc.subjectNanostructure
dc.subjectBeam (structure)
dc.subjectNanotechnology
dc.subjectOptics
dc.subjectIon
dc.subjectChemistry
dc.titleFocused-ion-beam nanostructuring of Al<sub>2</sub>O<sub>3</sub>dielectric layers for photonic applications
dc.typeArticle
dspace.entity.typePublication
local.authorid.openalexA5059641863

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