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Focused-ion-beam nanostructuring of Al<sub>2</sub>O<sub>3</sub>dielectric layers for photonic applications

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dc.contributor.authorAy, Feridun
dc.contributor.authorKerstin Wörhoff
dc.contributor.authorR.M. de Ridder
dc.contributor.authorMarkus Pollnau
dc.contributor.orcid0000-0003-2255-1156
dc.contributor.orcid0000-0003-4535-4358
dc.date.accessioned2025-11-13T10:11:56Z
dc.date.issued2012-08-23
dc.identifier.doihttps://doi.org/10.1088/0960-1317/22/10/105008
dc.identifier.endpage105008
dc.identifier.issn0960-1317
dc.identifier.issue10
dc.identifier.openalexW2106354788
dc.identifier.startpage105008
dc.identifier.urihttps://hdl.handle.net/11421/3420
dc.identifier.urihttps://doi.org/10.1088/0960-1317/22/10/105008
dc.identifier.volume22
dc.language.isoen
dc.relation.ispartofJournal of Micromechanics and Microengineering
dc.rightsrestrictedAccess
dc.subjectMaterials science
dc.subjectDwell time
dc.subjectFocused ion beam
dc.subjectFabrication
dc.subjectIon beam
dc.subjectDielectric
dc.subjectOptoelectronics
dc.subjectPhotonics
dc.subjectNanostructure
dc.subjectBeam (structure)
dc.subjectNanotechnology
dc.subjectOptics
dc.subjectIon
dc.subjectChemistry
dc.titleFocused-ion-beam nanostructuring of Al<sub>2</sub>O<sub>3</sub>dielectric layers for photonic applications
dc.typeArticle
dspace.entity.typePublication
local.authorid.openalexA5059641863

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