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Influence of deposition technique on growth and resistivity of Ta/NiFe nano films

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dc.contributor.authorÇınar, Hakan
dc.contributor.authorYıldırım, Mustafa
dc.contributor.authorHakan Çınar
dc.contributor.authorRamis Mustafa Öksüzoğlu
dc.contributor.orcid0000-0002-8149-6022
dc.contributor.orcid0000-0002-0574-5170
dc.date.accessioned2025-11-13T21:30:02Z
dc.date.issued2009-08-16
dc.identifier.doihttps://doi.org/10.1107/s0108767309095671
dc.identifier.endpages208
dc.identifier.issn0108-7673
dc.identifier.issuea1
dc.identifier.openalexW2323512797
dc.identifier.startpages208
dc.identifier.urihttps://hdl.handle.net/11421/13651
dc.identifier.urihttps://doi.org/10.1107/s0108767309095671
dc.identifier.volume65
dc.language.isoen
dc.relation.ispartofActa Crystallographica Section A Foundations of Crystallography
dc.rightsopenAccess
dc.subjectElectrical resistivity and conductivity
dc.subjectNano-
dc.subjectMaterials science
dc.subjectDeposition (geology)
dc.subjectMetallurgy
dc.subjectNanotechnology
dc.subjectComposite material
dc.subjectElectrical engineering
dc.subjectEngineering
dc.subjectGeology
dc.subject.sdg13
dc.titleInfluence of deposition technique on growth and resistivity of Ta/NiFe nano films
dc.typeArticle
dspace.entity.typePublication
local.authorid.openalexA5014164334
local.authorid.openalexA5083570750

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