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FESEM, XRD and DRS studies of electrochemically deposited boron doped ZnO films

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dc.contributor.authorÇağlar, Yasemin
dc.contributor.authorIlıcan, Saliha
dc.contributor.authorÇağlar, Müjdat
dc.contributor.orcid0000-0001-8462-0925
dc.contributor.orcid0000-0001-9724-7664
dc.date.accessioned2025-11-13T11:19:28Z
dc.date.issued2017-12-20
dc.identifier.doihttps://doi.org/10.1515/msp-2017-0091
dc.identifier.endpage829
dc.identifier.issn2083-1331
dc.identifier.issue4
dc.identifier.openalexW2790613913
dc.identifier.startpage824
dc.identifier.urihttps://hdl.handle.net/11421/6426
dc.identifier.urihttps://doi.org/10.1515/msp-2017-0091
dc.identifier.volume35
dc.language.isoen
dc.relation.ispartofMaterials Science-Poland
dc.rightsopenAccess
dc.subjectMaterials science
dc.subjectWurtzite crystal structure
dc.subjectDoping
dc.subjectBand gap
dc.subjectBoron
dc.subjectAnalytical Chemistry (journal)
dc.subjectCrystallite
dc.subjectScanning electron microscope
dc.subjectChronoamperometry
dc.subjectNanotechnology
dc.subjectZinc
dc.subjectElectrochemistry
dc.subjectOptoelectronics
dc.subjectCyclic voltammetry
dc.subjectMetallurgy
dc.subjectChemistry
dc.subjectComposite material
dc.subjectElectrode
dc.subject.sdg6
dc.titleFESEM, XRD and DRS studies of electrochemically deposited boron doped ZnO films
dc.typeArticle
dspace.entity.typePublication
local.authorid.openalexA5030901812
local.authorid.openalexA5060958239
local.authorid.openalexA5077974474

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