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IFVD-based large intermixing selectivity window process for high power laser diodes

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dc.contributor.authorŞahin, Seval
dc.contributor.authorSeval Şahin
dc.contributor.authorAbdullah Demir
dc.contributor.authorAtilla Aydınlı
dc.contributor.orcid0000-0001-8867-3370
dc.contributor.orcid0000-0002-0175-538X
dc.contributor.orcid0000-0003-4678-0084
dc.contributor.orcid0000-0001-5952-5993
dc.date.accessioned2025-11-13T22:38:39Z
dc.date.issued2018-05-09
dc.identifier.doihttps://doi.org/10.1117/12.2306833
dc.identifier.openalexW2801338758
dc.identifier.urihttps://hdl.handle.net/11421/14836
dc.identifier.urihttps://doi.org/10.1117/12.2306833
dc.language.isoen
dc.rightsrestrictedAccess
dc.subjectMaterials science
dc.subjectOptoelectronics
dc.subjectLaser
dc.subjectDiode
dc.subjectBilayer
dc.subjectSemiconductor laser theory
dc.subjectAnnealing (glass)
dc.subjectSemiconductor
dc.subjectDielectric
dc.subjectQuantum well
dc.subjectOptics
dc.subjectChemistry
dc.subject.sdg15
dc.titleIFVD-based large intermixing selectivity window process for high power laser diodes
dc.typeArticle
dspace.entity.typePublication
local.authorid.openalexA5020482951

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