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Structural transformations of TiO2 films with deposition temperature and electrical properties of nanostructure n-TiO2/p-Si heterojunction diode

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dc.contributor.authorAksoy, Seval
dc.contributor.authorÇağlar, Yasemin
dc.contributor.orcid0000-0001-8462-0925
dc.date.accessioned2025-11-13T09:15:34Z
dc.date.issued2014-06-13
dc.identifier.doihttps://doi.org/10.1016/j.jallcom.2014.05.192
dc.identifier.endpage337
dc.identifier.issn0925-8388
dc.identifier.openalexW2033432782
dc.identifier.startpage330
dc.identifier.urihttps://hdl.handle.net/11421/926
dc.identifier.urihttps://doi.org/10.1016/j.jallcom.2014.05.192
dc.identifier.volume613
dc.language.isoen
dc.relation.ispartofJournal of Alloys and Compounds
dc.rightsrestrictedAccess
dc.subjectHeterojunction
dc.subjectMaterials science
dc.subjectAnatase
dc.subjectSpin coating
dc.subjectNanostructure
dc.subjectDiode
dc.subjectScanning electron microscope
dc.subjectSemiconductor
dc.subjectRutile
dc.subjectThin film
dc.subjectAnalytical Chemistry (journal)
dc.subjectNanotechnology
dc.subjectOptoelectronics
dc.subjectChemical engineering
dc.subjectChemistry
dc.subjectPhotocatalysis
dc.subjectComposite material
dc.titleStructural transformations of TiO2 films with deposition temperature and electrical properties of nanostructure n-TiO2/p-Si heterojunction diode
dc.typeArticle
dspace.entity.typePublication
local.authorid.openalexA5111492712
local.authorid.openalexA5030901812

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