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Atomic Layer Deposition of Ultrathin Nickel Sulfide Films and Preliminary Assessment of Their Performance as Hydrogen Evolution Catalysts

dc.contributor.authorÇimen, Yasemin
dc.contributor.authorAaron W. Peters
dc.contributor.authorJason R. Avila
dc.contributor.authorWilliam L. Hoffeditz
dc.contributor.authorSubhadip Goswami
dc.contributor.authorOmar K. Farha
dc.contributor.authorJoseph T. Hupp
dc.contributor.orcid0000-0002-6554-8507
dc.contributor.orcid0000-0002-0478-5875
dc.contributor.orcid0000-0003-2257-4331
dc.contributor.orcid0000-0002-8462-9054
dc.contributor.orcid0000-0002-9904-9845
dc.contributor.orcid0000-0003-3982-9812
dc.date.accessioned2025-11-13T09:30:51Z
dc.date.issued2016-11-07
dc.identifier.doihttps://doi.org/10.1021/acs.langmuir.6b02699
dc.identifier.endpage12012
dc.identifier.issn0743-7463
dc.identifier.issue46
dc.identifier.openalexW2556282570
dc.identifier.startpage12005
dc.identifier.urihttps://hdl.handle.net/11421/1357
dc.identifier.urihttps://doi.org/10.1021/acs.langmuir.6b02699
dc.identifier.volume32
dc.language.isoen
dc.relation.ispartofLangmuir
dc.rightsopenAccess
dc.subjectAtomic layer deposition
dc.subjectNickel
dc.subjectX-ray photoelectron spectroscopy
dc.subjectNickel sulfide
dc.subjectQuartz crystal microbalance
dc.subjectThin film
dc.subjectChemical engineering
dc.subjectSulfide
dc.subjectCatalysis
dc.subjectMaterials science
dc.subjectIron sulfide
dc.subjectInorganic chemistry
dc.subjectAnalytical Chemistry (journal)
dc.subjectChemistry
dc.subjectNanotechnology
dc.subjectSulfur
dc.subjectAdsorption
dc.subjectMetallurgy
dc.subjectPhysical chemistry
dc.subjectOrganic chemistry
dc.titleAtomic Layer Deposition of Ultrathin Nickel Sulfide Films and Preliminary Assessment of Their Performance as Hydrogen Evolution Catalysts
dc.typeArticle
dspace.entity.typePublication
local.authorid.openalexA5069871855

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